Subtask Due Pers-Hrs Comments
Mask Design Layout A -
(Modifications & enhance- B -
ments to existing S/W) C -
D 200 Basic -- modifications for DEIMOS
E 60 Enhanc. (eg, new auto-select algor.)
F 60 Enhancements
Mapping to Focal Plane A -
(Modifications & enhance- B -
ments to existing S/W) C -
D 120 Basic -- modifications for DEIMOS
E 60 Maintenance (improving WCS mapping)
F 60 Maintenance (improving WCS mapping)
Generating DXF Instructions A -
(Modifications & enhance- B 50 needed for fabricating calib. masks
ments to existing S/W) C -
D -
E -
F -
Astro. Coord. Utilities A -
(Adaptation of S/W) B -
C -
D 70 Basic: proper motion, coord. precess
E -
F -
Illustrative plots of masks A -
(Modifications to existing B 60 Basic diagram
S/W) C -
D -
E 50 Potential Enhancements
F -
Astrometry from DEIMOS A -
B 120 Design WCS parameterizations
B 70 S/W for calib. image analysis
C 80 Anal./parameterizing internal distort.
C 20 Select astrometric fields on sky
D 80 Init. astrom. calib. obs and analysis
E 120 Basic S/W for astrometry finished
F 60 Maintenance (improved WCS mapping)
Mask-fabrication, handling A -
and storage interface with B -
database. C 150 slitmask/database/mill procedures
D 80 fabr., handling interface at Keck
E -
F -
Start-up verification, A -
debugging of CNC mill S/W B 150
ments to existing S/W) C -
D -
E -
F -
A = CCD test (lab)
B = Instrument integration (lab)
C = Installation and commissioning in Hawaii
D = First science observations
E = One year after commissioning
F = Two years after commissioning
Andrew C. Phillips / Lick Observatory
phillips@ucolick.org